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Inventor profile of:

Mark Wilcoxson

City:

Oakland, California

Country:

United States

Published Applications:

25

Last publication date:

2017-06-06

Top Assignees for applications by Mark Wilcoxson

The entities that hold a legal rights for patent applications filed by inventor Wilcoxson Mark:

Recent patent applications by Wilcoxson Mark

Mark Wilcoxson from Oakland, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2017-06-06
US15069022
Electricity

Method for etching features in dielectric layers

 #2 | 2014-06-19
US20140170780A1
Electricity

Method of Low-K Dielectric Film Repair

 #3 | 2014-02-20
US20140048108A9
Electricity

Method of dielectric film treatment

 #4 | 2013-03-21
US20130068261A1
Performing operations; transporting

Multi-stage substrate cleaning method and apparatus

 #5 | 2012-05-10
US20120115332A1
Electricity

Method of Post Etch Polymer Residue Removal

 #6 | 2012-04-05
US20120079698A1
Electricity

Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus

 #7 | 2011-08-18
US20110197928A1
Electricity

Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus

 #8 | 2011-03-03
US20110048467A1
Electricity

Method for substrate cleaning including movement of substrate below substrate cleaning module

 #9 | 2010-12-16
US20100313917A1
Electricity

Method of particle contaminant removal

 #10 | 2010-11-18
US20100288311A1
Performing operations; transporting

Multi-stage substrate cleaning method and apparatus

 #11 | 2010-10-28
US20100269285A1
Electricity

Apparatus and system for cleaning substrate

 #12 | 2010-10-14
US20100258142A1
Performing operations; transporting

APPARATUS AND METHOD FOR USING A VISCOELASTIC CLEANING MATERIAL TO REMOVE PARTICLES ON A SUBSTRATE

 #13 | 2010-09-16
US20100229890A1
Electricity

Method of particle contaminant removal

 #14 | 2010-07-20
US11253118
-

Apparatus for cleaning edge of substrate and method for using the same

 #15 | 2010-03-25
US20100071730A1
Chemistry; metallurgy

Methods for atomic layer deposition (ALD) using a proximity meniscus

 #16 | 2010-01-21
US20100015731A1
Electricity

Method of low-k dielectric film repair

 #17 | 2009-12-15
US11173729
-

Method and apparatus for atomic layer deposition (ALD) in a proximity system

 #18 | 2009-10-01
US20090246372A1
Performing operations; transporting

Method of preventing premature drying

 #19 | 2009-09-17
US20090229638A1
Electricity

METHOD OF DIELECTRIC FILM TREATMENT

 #20 | 2009-08-27
US20090211596A1
Electricity

Method of post etch polymer residue removal

 #21 | 2009-07-09
US20090173718A1
Electricity

Method of damaged low-k dielectric film layer removal

 #22 | 2008-07-17
US20080169008A1
Electricity

Enhanced wafer cleaning method

 #23 | 2008-04-03
US20080081775A1
Electricity

Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus

 #24 | 2007-10-18
US20070240737A1
Electricity

Post etch wafer surface cleaning with liquid meniscus

 #25 | 2006-06-15
US20060124153A1
Electricity

Enhanced wafer cleaning method
InventorID:

146045 ⎘