Caesarea
Israel
13
2019-10-10
The entities that hold a legal rights for patent applications filed by inventor Paskover Yuri:
Yuri Paskover from Caesarea, IL has applied for patents for these inventions. The list has both pending applications and granted patents:
Localized telecentricity and focus optimization for overlay metrology
#2 | 2018-11-27Compound objectives for imaging and scatterometry overlay
#3 | 2018-11-22Simultaneous capturing of overlay signals from multiple targets
#4 | 2018-10-11Systems and methods for metrology with layer-specific illumination spectra
#5 | 2018-06-07Process compatibility improvement by fill factor modulation
#6 | 2018-03-29Optical near-field metrology
#7 | 2018-03-22Self-moiré target design principles for measuring unresolved device-like pitches
#8 | 2018-02-01Simultaneous capturing of overlay signals from multiple targets
#9 | 2017-09-21Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields
#10 | 2017-05-25Topographic phase control for overlay measurement
#11 | 2017-05-25Self-moire target design principles for measuring unresolved device-like pitches
#12 | 2016-08-11Quality estimation and improvement of imaging metrology targets
#13 | 2016-03-24Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures
1482646 ⎘