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Inventor profile of:

Terutoshi MAEDA

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2025-08-14

Top Assignees for applications by Terutoshi MAEDA

The entities that hold a legal rights for patent applications filed by inventor MAEDA Terutoshi:

CHUGAI SEIYAKU KABUSHIKI KAISHA 5 Tokyo, Japan
HOFFMANN-LA ROCHE INC. 3 Little Falls, NJ United States
F. Hoffmann-La Roche AG 2 Basel, Switzerland
Chugai Seiyaku Kabushiki Kaish 1 Kita-ku, Tokyo, Japan
F.Hoffman - La Roche AG 1 Basel, Switzerland

Recent patent applications by MAEDA Terutoshi

Terutoshi MAEDA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-08-14

US20250257144A1

Chemistry; metallurgy

HIGH CONCENTRATION ANTIBODY-CONTAINING LIQUID FORMULATION

#2 | 2024-11-28

US20240392017A1

Chemistry; metallurgy

HIGH CONCENTRATION ANTIBODY-CONTAINING LIQUID FORMULATION

#3 | 2024-11-14

US20240376219A1

Chemistry; metallurgy

HIGH CONCENTRATION ANTIBODY-CONTAINING LIQUID FORMULATION

#4 | 2024-09-26

US20240317869A1

Chemistry; metallurgy

HIGH CONCENTRATION ANTIBODY-CONTAINING LIQUID FORMULATION

#5 | 2023-10-26

US20230340134A1

Chemistry; metallurgy

HIGH CONCENTRATION ANTIBODY-CONTAINING LIQUID FORMULATION

#6 | 2023-06-01

US20230167183A1

Chemistry; metallurgy

High concentration antibody-containing liquid formulation

#7 | 2022-09-08

US20220281988A1

Chemistry; metallurgy

High concentration antibody-containing liquid formulation

#8 | 2021-08-12

US20210246216A1

Chemistry; metallurgy

High concentration antibody-containing liquid formulation

#9 | 2020-03-12

US20200079857A1

Chemistry; metallurgy

High concentration antibody-containing liquid formulation

#10 | 2016-03-31

US20160090419A1

Chemistry; metallurgy

HIGH CONCENTRATION ANTIBODY-CONTAINING LIQUID FORMULATION

#11 | 2010-11-11

US20100285011A1

Chemistry; metallurgy

High concentration antibody-containing liquid formulation

InventorID:

1487650 ⎘