🔗 Permalink

Inventor profile of:

Boris Bittner

City:

Roth

Country:

Germany

Published Applications:

46

Last publication date:

2021-11-25

Top Assignees for applications by Boris Bittner

The entities that hold a legal rights for patent applications filed by inventor Bittner Boris:

Carl Zeiss SMT GmbH 40 Oberkochen, Germany
CARL ZEISS SMT AG 2 Oberkochen, Germany
Carl Zeiss SMT GmbH 1 Overkochen, Germany

Recent patent applications by Bittner Boris

Boris Bittner from Roth, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2021-11-25

US20210364677A1

Optical element having a coating for influencing heating radiation and optical arrangement

#2 | 2019-12-12

US20190377107A1

Optical element having a coating for influencing heating radiation and optical arrangement

#3 | 2019-01-24

US20190025709A1

LITHOGRAPHIC PROJECTION OBJECTIVE

#4 | 2018-06-21

US20180173100A1

Projection exposure apparatus with at least one manipulator

#5 | 2018-05-17

US20180136565A1

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY

#6 | 2018-03-22

US20180081281A1

Projection lens with wave front manipulator and related method and apparatus

#7 | 2018-03-01

US20180059413A1

Wavefront correction element for use in an optical system

#8 | 2017-09-14

US20170261730A9

Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element

#9 | 2017-08-03

US20170219932A1

Projection exposure apparatus with at least one manipulator

#10 | 2017-05-04

US20170123118A1

Optical element having a coating for influencing heating radiation and optical arrangement

#11 | 2017-04-27

US20170115576A1

Projection exposure apparatus including at least one mirror

#12 | 2017-02-02

US20170031247A1

Lithographic projection objective

#13 | 2016-12-29

US20160377988A1

Optical element and optical arrangement therewith

#14 | 2016-09-01

US20160252824A1

Projection exposure apparatus with optimized adjustment possibility

#15 | 2016-07-28

US20160216616A1

Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus

#16 | 2016-07-21

US20160209754A1

Projection exposure method and projection exposure apparatus for microlithography

#17 | 2016-06-09

US20160161852A1

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHOD FOR PROCESSING A MIRROR

#18 | 2016-06-09

US20160161845A1

Method of operating a microlithographic projection apparatus

#19 | 2016-03-31

US20160091798A1

Optical assembly

#20 | 2016-02-25

US20160054662A1

Projection exposure apparatus with a highly flexible manipulator

#21 | 2016-02-04

US20160033873A1

Projection exposure apparatus with at least one manipulator

#22 | 2016-01-14

US20160011521A1

Microlithographic apparatus

#23 | 2015-11-05

US20150316851A1

Reflective optical element for EUV lithography and method of manufacturing a reflective optical element

#24 | 2015-06-18

US20150168674A1

Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus

#25 | 2015-06-11

US20150160562A1

System correction from long timescales

#26 | 2015-04-30

US20150116703A1

Reflective optical element

#27 | 2014-11-27

US20140347721A1

Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element

#28 | 2014-11-06

US20140327892A1

Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus

#29 | 2014-10-16

US20140307308A1

Reflective Optical Element for the EUV Wavelength Range, Method for Producing and for Correcting Such an Element, Projection Lens for Microlithography Comprising Such an Element, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection Lens

#30 | 2014-08-28

US20140239192A1

Illumination and displacement device for a projection exposure apparatus

#31 | 2014-07-03

US20140185024A1

Projection objective of a microlithographic projection exposure apparatus

#32 | 2014-06-26

US20140176924A1

Projection exposure apparatus with optimized adjustment possibility

#33 | 2014-04-17

US20140104587A1

Projection arrangement

#34 | 2014-03-20

US20140078482A1

Lithographic projection objective

#35 | 2013-10-03

US20130258302A1

Projection exposure apparatus with at least one manipulator

#36 | 2013-09-26

US20130250266A1

Projection exposure apparatus with optimized adjustment possibility

#37 | 2013-07-25

US20130188246A1

Imaging optical system for microlithography

#38 | 2013-03-21

US20130070221A1

Microlithographic projection exposure apparatus

#39 | 2012-07-26

US20120188636A1

Method for correcting a lithography projection objective, and such a projection objective

#40 | 2012-07-26

US20120188524A1

Projection exposure apparatus with optimized adjustment possibility

#41 | 2011-11-17

US20110279803A1

Method for correcting a lithography projection objective, and such a projection objective

#42 | 2011-08-02

US12896128

Projection objective of a microlithographic projection exposure apparatus

#43 | 2011-07-28

US20110181855A1

Projection exposure apparatus with optimized adjustment possibility

#44 | 2009-06-18

US20090153829A1

Lithographic projection objective

#45 | 2008-10-02

US20080239503A1

Projection objective of a microlithographic projection exposure apparatus

#46 | 2007-01-25

US20070019305A1

Method for correcting a lithography projection objective, and such a projection objective

InventorID:

149759 ⎘