Werneck
Germany
59
2025-02-27
The entities that hold a legal rights for patent applications filed by inventor Wabra Norbert:
Norbert Wabra from Werneck, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
OPTICAL ELEMENT, AND ASSEMBLY AND OPTICAL SYSTEM THEREWITH
#2 | 2023-05-04OPTICAL ELEMENT, OPTICAL SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR OPERATING AN OPTICAL ELEMENT
#3 | 2021-11-25Optical element having a coating for influencing heating radiation and optical arrangement
#4 | 2021-11-11Projection exposure system for semiconductor lithography having an optical arrangement
#5 | 2019-12-12Optical element having a coating for influencing heating radiation and optical arrangement
#6 | 2019-03-07LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME
#7 | 2018-12-27PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#8 | 2018-12-20Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography
#9 | 2018-06-21Projection exposure apparatus with at least one manipulator
#10 | 2018-05-17PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
#11 | 2018-03-22Projection lens with wave front manipulator and related method and apparatus
#12 | 2017-09-14Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element
#13 | 2017-08-10Projection objective for a microlithographic projection exposure apparatus
#14 | 2017-06-15Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography
#15 | 2017-05-04Optical element having a coating for influencing heating radiation and optical arrangement
#16 | 2017-04-27Projection exposure apparatus including at least one mirror
#17 | 2017-03-23Microlithographic projection exposure apparatus and measuring device for a projection lens
#18 | 2016-12-29Optical element and optical arrangement therewith
#19 | 2016-12-22Lithography projection objective, and a method for correcting image defects of the same
#20 | 2016-09-29Projection objective for a microlithographic projection exposure apparatus
#21 | 2016-07-21Projection exposure method and projection exposure apparatus for microlithography
#22 | 2016-06-09MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHOD FOR PROCESSING A MIRROR
#23 | 2016-06-09Method of operating a microlithographic projection apparatus
#24 | 2016-03-31Optical assembly
#25 | 2016-02-25Projection exposure apparatus with a highly flexible manipulator
#26 | 2016-02-04Projection exposure apparatus with at least one manipulator
#27 | 2016-01-14Microlithographic apparatus
#28 | 2015-11-05Reflective optical element for EUV lithography and method of manufacturing a reflective optical element
#29 | 2015-06-18Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus
#30 | 2015-06-11System correction from long timescales
#31 | 2015-04-30Reflective optical element
#32 | 2015-02-26Projection objective for a microlithographic projection exposure apparatus
#33 | 2014-11-27Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element
#34 | 2014-11-06Lithography projection objective, and a method for correcting image defects of the same
#35 | 2014-10-16Reflective Optical Element for the EUV Wavelength Range, Method for Producing and for Correcting Such an Element, Projection Lens for Microlithography Comprising Such an Element, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection Lens
#36 | 2014-08-28Illumination and displacement device for a projection exposure apparatus
#37 | 2014-07-03Projection objective of a microlithographic projection exposure apparatus
#38 | 2013-10-03Projection exposure apparatus with at least one manipulator
#39 | 2013-05-16Exposure apparatus and measuring device for a projection lens
#40 | 2013-03-21Projection lens system of a microlithographic projection exposure installation
#41 | 2013-03-21Microlithographic projection exposure apparatus
#42 | 2012-07-26Method for correcting a lithography projection objective, and such a projection objective
#43 | 2012-02-09Projection objective for a microlithographic projection exposure apparatus
#44 | 2012-01-26Lithography projection objective, and a method for correcting image defects of the same
#45 | 2011-11-17Method for correcting a lithography projection objective, and such a projection objective
#46 | 2011-09-22PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#47 | 2010-10-21Projection lens system of a microlithographic projection exposure installation
#48 | 2010-06-24Lithography projection objective, and a method for correcting image defects of the same
#49 | 2010-06-10Exposure apparatus and measuring device for a projection lens
#50 | 2009-04-23Lithography projection objective, and a method for correcting image defects of the same
#51 | 2008-12-18MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
#52 | 2008-12-11PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#53 | 2008-06-19Lithography projection objective, and a method for correcting image defects of the same
#54 | 2008-05-29Projection objective for a microlithographic projection exposure apparatus
#55 | 2008-05-08Projection lens system of a microlithographic projection exposure installation
#56 | 2007-12-13Imaging system for a microlithographical projection light system
#57 | 2007-07-19Projection objective for a microlithographic projection exposure apparatus
#58 | 2007-03-29MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
#59 | 2007-01-25Method for correcting a lithography projection objective, and such a projection objective
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