Heidenheim
Germany
18
2013-07-18
The entities that hold a legal rights for patent applications filed by inventor Beierl Helmut:
Helmut Beierl from Heidenheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Projection exposure system and projection exposure method
#2 | 2013-03-21Projection lens system of a microlithographic projection exposure installation
#3 | 2012-04-19Microlithographic projection exposure apparatus
#4 | 2010-10-21Projection lens system of a microlithographic projection exposure installation
#5 | 2010-08-12Projection objective for microlithography
#6 | 2009-03-19Microlithographic projection exposure apparatus
#7 | 2008-12-25CATADIOPTRIC PROJECTION OBJECTIVE WITH GEOMETRIC BEAM SPLITTING
#8 | 2008-05-08Projection lens system of a microlithographic projection exposure installation
#9 | 2007-05-17Refractive projection objective for immersion lithography
#10 | 2006-11-14Catadioptric reduction lens
#11 | 2006-04-13Catadioptric projection objective with geometric beam splitting
#12 | 2006-02-28Catadioptric reduction lens
#13 | 2006-01-10Catadioptric optical system and exposure apparatus having the same
#14 | 2005-09-01Refractive projection objective for immersion lithography
#15 | 2005-08-25Catadioptric projection objective with geometric beam splitting
#16 | 2005-07-21Projection objective having adjacently mounted aspheric lens surfaces
#17 | 2005-06-07Projection objective having adjacently mounted aspheric lens surfaces
#18 | 2005-06-02Catadioptric projection objective with geometric beam splitting
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