Aalen
Germany
25
2019-04-04
The entities that hold a legal rights for patent applications filed by inventor Mueller Ralf:
Ralf Mueller from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Catadioptric projection objective including a reflective optical component and a measuring device
#2 | 2018-08-09Illumination system for EUV projection lithography
#3 | 2017-08-31Illumination optical unit for EUV projection lithography
#4 | 2016-11-24Method of operating a projection exposure tool for microlithography
#5 | 2016-09-01Illumination system for EUV projection lithography
#6 | 2015-10-15Imaging optical unit and projection exposure apparatus for projection lithography, having such imaging optical unit
#7 | 2013-11-14Method of operating a projection exposure tool for microlithography
#8 | 2013-03-21Imaging optical system
#9 | 2012-09-06Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus
#10 | 2012-08-30Catadioptric projection objective including a reflective optical component and a measuring device
#11 | 2012-08-16Imaging optics
#12 | 2011-12-15Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror
#13 | 2011-07-07Projection objective and projection exposure apparatus for microlithography
#14 | 2011-05-12Polarization-modulating optical element and method for manufacturing thereof
#15 | 2011-03-31Catadioptric projection objective
#16 | 2010-11-04Illumination system of a microlithographic projection exposure apparatus
#17 | 2010-09-16Optical system
#18 | 2010-06-24Illumination system of a microlithographic projection exposure apparatus
#19 | 2010-06-03Interference systems for microlithgraphic projection exposure systems
#20 | 2010-04-22High transmission, high aperture catadioptric projection objective and projection exposure apparatus
#21 | 2009-12-10Optimization and matching of optical systems by use of orientation Zernike polynomials
#22 | 2008-12-04Projection objective and projection exposure apparatus for microlithography
#23 | 2008-07-03Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror
#24 | 2007-09-13Polarization-modulating optical element and method for manufacturing thereof
#25 | 2007-01-11Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus
149771 ⎘