Benjamin Uhlig

City:

Dresden

Country:

Germany

Published Applications:

Last publication date:

2016-04-14

Top Assignees for applications by Benjamin Uhlig

The entities that hold a legal rights for patent applications filed by inventor Uhlig Benjamin:

Benjamin Uhlig from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Semiconductor structure including a layer of a first metal between a diffusion barrier layer and a second metal and method for the formation thereof

InventorID:

1501251 ⎘