Tsukuba
Japan
4
2020-11-26
The entities that hold a legal rights for patent applications filed by inventor OSHCHEPKOV Ivan:
Ivan OSHCHEPKOV from Tsukuba, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
Ultra-low temperature ALD to form high-quality Si-containing film
#2 | 2019-01-24VAPOR DISPOSITION OF SILICON-CONTAINING FILMS USING PENTA-SUBSTITUTED DISILANES
#3 | 2017-06-29VAPOR DEPOSITION OF SILICON-CONTAINING FILMS USING PENTA-SUBSTITUTED DISILANES
#4 | 2016-04-21Vapor deposition of silicon-containing films using penta-substituted disilanes
1507709 ⎘