Hidehiro NAKAMURA

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2025-09-25

Top Assignees for applications by Hidehiro NAKAMURA

The entities that hold a legal rights for patent applications filed by inventor NAKAMURA Hidehiro:

HITACHI CHEMICAL COMPANY, LTD. 6 Tokyo, Japan

Recent patent applications by NAKAMURA Hidehiro

Hidehiro NAKAMURA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-09-25

US20250297129A1

Chemistry; metallurgy

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, AND SEMICONDUCTOR PACKAGE

#2 | 2019-07-18

US20190217242A1

Performing operations; transporting

ADSORBENT, METHOD FOR PRODUCING SAME, METHOD FOR REMOVING CARBON DIOXIDE, DEVICE FOR REMOVING CARBON DIOXIDE, AND AIR CONDITIONER

#3 | 2019-01-24

US20190022572A1

Performing operations; transporting

Carbon Dioxide Separation/Recovery Device, Combustion System Using Same, Thermal Power Generation System Using Same, and Method for Separating and Recovering Carbon Dioxide

#4 | 2018-09-06

US20180250629A1

Performing operations; transporting

Exhaust-gas treatment equipment and gas-capture-material deterioration-state estimating method

#5 | 2018-01-25

US20180021717A1

Performing operations; transporting

COconcentration reducing device

#6 | 2017-01-19

US20170014750A1

Performing operations; transporting

CO2 removal device

#7 | 2016-08-04

US20160220943A1

Performing operations; transporting

CARBON-DIOXIDE RECOVERY APPARATUS, AND CARBON-DIOXIDE RECOVERY METHOD

#8 | 2016-07-14

US20160199808A1

Performing operations; transporting

CARBON-DIOXIDE CAPTURING MATERIAL, AND CARBON-DIOXIDE RECOVERY APPARATUS USING SAME

InventorID:

1589504 ⎘