Tobias HACKL

City:

Langenau

Country:

Germany

Published Applications:

Last publication date:

2016-07-21

Top Assignees for applications by Tobias HACKL

The entities that hold a legal rights for patent applications filed by inventor HACKL Tobias:

Tobias HACKL from Langenau, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Surface correction of mirrors with decoupling coating

Optical system for EUV lithography with a charged-particle source

InventorID:

1599050 ⎘