William Hunks

City:

Danbury, Connecticut

Country:

United States

Published Applications:

Last publication date:

2018-05-10

Top Assignees for applications by William Hunks

The entities that hold a legal rights for patent applications filed by inventor Hunks William:

William Hunks from Danbury, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Precursors for silicon dioxide gap fill

AMINE CATALYSTS FOR LOW TEMPERATURE ALD/CVD SiO2 DEPOSITION USING HEXACHLORODISILANE/H2O

Cyclopentadienyl titanium alkoxides with ozone activated ligands for ALD of TiO2

DOPING OF ZrO2 FOR DRAM APPLICATIONS

PRECURSORS FOR SILICON DIOXIDE GAP FILL

InventorID:

1613600 ⎘