San Jose, California
United States
6
2018-05-24
The entities that hold a legal rights for patent applications filed by inventor Faltermeier Johnathan E.:
Johnathan E. Faltermeier from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:
HIGH-K LAYER CHAMFERING TO PREVENT OXYGEN INGRESS IN REPLACEMENT METAL GATE (RMG) PROCESS
#2 | 2017-07-06High-K layer chamfering to prevent oxygen ingress in replacement metal gate (RMG) process
#3 | 2017-06-15Partially dielectric isolated fin-shaped field effect transistor (FinFET)
#4 | 2017-01-03Partially dielectric isolated fin-shaped field effect transistor (FinFET)
#5 | 2016-08-04Nitridation on HDP oxide before high-k deposition to prevent oxygen ingress
#6 | 2016-08-04Nitridation on HDP oxide before high-k deposition to prevent oxygen ingress
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