Oberkochen
Germany
20
2022-12-29
The entities that hold a legal rights for patent applications filed by inventor Major Andras G.:
Andras G. Major from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
PARTICLE BEAM SYSTEM HAVING A MULTI-POLE LENS SEQUENCE FOR INDEPENDENTLY FOCUSSING A MULTIPLICITY OF INDIVIDUAL PARTICLE BEAMS, AND ITS USE AND ASSOCIATED METHOD
#2 | 2022-12-08CERTAIN IMPROVEMENTS OF MULTI-BEAM GENERATING AND MULTI-BEAM DEFLECTING UNITS
#3 | 2022-03-31Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system
#4 | 2018-08-30METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#5 | 2016-09-15Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#6 | 2015-10-22Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#7 | 2014-08-21Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#8 | 2014-08-14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#9 | 2013-09-05Method and arrangement for determining the heating condition of a mirror in an optical system
#10 | 2013-03-28Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
#11 | 2013-03-28Microlithographic projection exposure apparatus
#12 | 2012-11-22Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#13 | 2012-08-23Device for guiding electromagnetic radiation into a projection exposure apparatus
#14 | 2012-05-24OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY
#15 | 2012-01-05Microlithographic projection exposure apparatus
#16 | 2011-01-20Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
#17 | 2010-11-04Illumination system of a microlithographic projection exposure apparatus
#18 | 2010-06-24Illumination system of a microlithographic projection exposure apparatus
#19 | 2010-04-29Illumination system of a microlithographic projection exposure apparatus
#20 | 2010-02-18Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
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