Aalen
Germany
74
2018-08-30
The entities that hold a legal rights for patent applications filed by inventor Maul Manfred:
Manfred Maul from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#2 | 2018-08-02Method of operating a microlithographic projection apparatus and illumination system of such an apparatus
#3 | 2017-07-06Illumination system for microlithography
#4 | 2017-07-06Spectacle lens for a display device that can be fitted on the head of a user and generates an image
#5 | 2017-02-09Method for adjusting a display device
#6 | 2016-09-15Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#7 | 2016-09-08Correction of optical elements by correction light irradiated in a flat manner
#8 | 2016-06-09Illumination system for microlithography
#9 | 2016-03-17Illumination system for a microlithographic projection exposure apparatus
#10 | 2015-12-10Illumination optical unit for projection lithography
#11 | 2015-12-03Illumination optical unit for projection lithography
#12 | 2015-10-22Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#13 | 2015-09-10Optical system of a microlithographic projection exposure apparatus
#14 | 2015-06-25Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
#15 | 2015-06-18EUV light source for generating a usable output beam for a projection exposure apparatus
#16 | 2015-06-04Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element
#17 | 2015-03-05Correction of optical elements by correction light irradiated in a flat manner
#18 | 2015-02-26Illumination optical unit for projection lithography
#19 | 2015-01-22Illumination system for microlithography
#20 | 2015-01-15Illumination optical unit for projection lithography
#21 | 2014-08-21Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#22 | 2014-08-14Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#23 | 2014-07-31MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#24 | 2014-03-20Correction of optical elements by correction light irradiated in a flat manner
#25 | 2013-10-24Filter device for the compensation of an asymmetric pupil illumination
#26 | 2013-06-13Illumination system for a microlithographic projection exposure apparatus
#27 | 2013-03-28Microlithographic projection exposure apparatus
#28 | 2012-11-22Illumination system of a microlithographic projection exposure apparatus
#29 | 2012-11-22Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#30 | 2012-11-08Filter device for the compensation of an asymmetric pupil illumination
#31 | 2012-07-26Illumination system of a microlithographic projection exposure apparatus
#32 | 2012-01-26Illumination system for microlithography
#33 | 2012-01-19Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light
#34 | 2011-12-08Filter device for the compensation of an asymmetric pupil illumination
#35 | 2011-11-24Illumination system for a microlithographic projection exposure apparatus
#36 | 2011-04-07EUV illumination system with a system for measuring fluctuations of the light source
#37 | 2010-12-09Filter device for the compensation of an asymmetric pupil illumination
#38 | 2010-11-11Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
#39 | 2010-11-11Microlithographic projection exposure apparatus
#40 | 2010-08-05ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION
#41 | 2010-03-11Correction of optical elements by correction light irradiated in a flat manner
#42 | 2010-02-18Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#43 | 2010-01-07Illumination system of a microlithographic projection exposure apparatus
#44 | 2009-12-31Illumination system of a microlithographic projection exposure apparatus
#45 | 2009-10-22ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS
#46 | 2009-01-22Illumination system for a microlithographic projection exposure apparatus
#47 | 2008-10-23EUV illumination system with a system for measuring fluctuations of the light source
#48 | 2008-10-02Illumination system and polarizer for a microlithographic projection exposure apparatus
#49 | 2008-09-18Projection exposure system, beam delivery system and method of generating a beam of light
#50 | 2008-05-15Filter device for the compensation of an asymmetric pupil illumination
#51 | 2008-02-14Method For Structuring A Substrate Using Multiple Exposure
#52 | 2008-01-10Method of optimizing imaging performance
#53 | 2007-12-06LIGHT MIXING DEVICE, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#54 | 2007-09-20Optical system of an illumination device of a projection exposure apparatus
#55 | 2007-09-06System for reducing the coherence of laser radiation
#56 | 2007-09-06Illumination system for a microlithographic projection exposure apparatus
#57 | 2007-07-19Illumination system for a microlithography projection exposure installation
#58 | 2007-03-15Illumination system for microlithography
#59 | 2007-02-20Objective with fluoride crystal lenses
#60 | 2006-12-28Microlithography exposure method and projection exposure apparatus for carrying out the method
#61 | 2006-12-05Objective with fluoride crystal lenses
#62 | 2006-11-30Illumination system for a microlithographic projection exposure apparatus
#63 | 2006-08-03Objective with fluoride crystal lenses
#64 | 2006-07-06Optical beam transformation system and illumination system comprising an optical beam transformation system
#65 | 2005-12-01Projection lens and microlithographic projection exposure apparatus
#66 | 2005-11-03Optical system of a microlithographic projection exposure apparatus
#67 | 2005-10-27Optical unit for an illumination system of a microlithographic projection exposure apparatus
#68 | 2005-10-27Method of optimizing imaging performance
#69 | 2005-10-06Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus
#70 | 2005-06-30Illumination system and polarizer for a microlithographic projection exposure apparatus
#71 | 2005-06-23PROJECTION LENS AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#72 | 2005-06-09Objective with fluoride crystal lenses
#73 | 2005-04-12Projection lens and microlithographic projection exposure apparatus
#74 | 2005-01-06Microlithographic illumination method and a projection lens for carrying out the method
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