Inventor profile of:

Jochen Hetzler

City:

Aalen

Country:

Germany

Published Applications:

37

Last publication date:

2025-05-01

Top Assignees for applications by Jochen Hetzler

The entities that hold a legal rights for patent applications filed by inventor Hetzler Jochen:

Recent patent applications by Hetzler Jochen

Jochen Hetzler from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-05-01
US20250137878A1
Physics

MEASURING ASSEMBLY FOR DETECTING A DISTANCE BETWEEN TWO ELEMENTS, DISTANCE MEASURING DEVICE, OPTICAL MEASURING SYSTEM AND METHOD

#2 | 2024-03-07
US20240077305A1
Physics

MEASUREMENT DEVICE FOR INTERFEROMETRIC MEASUREMENT OF A SURFACE SHAPE

#3 | 2023-02-16
US20230050291A1
Physics

Method and device for correcting a telecentricity error of an imaging device

#4 | 2022-12-08
US20220390709A1
Physics

MEASURING DEVICE FOR INTERFEROMETRIC SHAPE MEASUREMENT

#5 | 2022-11-03
US20220349700A1
Physics

MEASURING APPARATUS FOR INTERFEROMETRIC SHAPE MEASUREMENT

#6 | 2022-06-16
US20220187061A1
Physics

Method for calibrating a measuring apparatus

#7 | 2022-06-02
US20220170735A1
Physics

Diffractive optical element for a test interferometer

#8 | 2022-01-13
US20220011095A1
Physics

MEASUREMENT METHOD FOR INTERFEROMETRICALLY DETERMINING A SURFACE SHAPE

#9 | 2021-12-02
US20210372781A1
Physics

Device and method for characterizing the surface shape of a test object

#10 | 2020-07-16
US20200225028A1
Physics

Compensation optical system for an interferometric measuring system

#11 | 2019-05-23
US20190154427A1
Physics

Measuring device for interferometric determination of a shape of an optical surface

#12 | 2019-02-14
US20190049853A1
Physics

Method for aligning a mirror of a microlithographic projection exposure apparatus

#13 | 2018-04-19
US20180106591A1
Physics

Interferometric measuring arrangement

#14 | 2018-03-29
US20180087891A1
Physics

Measuring method and measuring arrangement for an imaging optical system

#15 | 2017-12-28
US20170371251A1
Physics

Projection exposure tool for microlithography and method for microlithographic imaging

#16 | 2017-11-30
US20170343449A1
Physics

Test device and method for testing a mirror

#17 | 2017-03-23
US20170082931A1
Physics

Projection exposure tool for microlithography and method for microlithographic imaging

#18 | 2017-01-26
US20170023865A1
Physics

Method for aligning a mirror of a microlithographic projection exposure apparatus

#19 | 2016-05-05
US20160123724A1
Physics

Mask inspection system for inspecting lithography masks

#20 | 2016-04-28
US20160116851A1
Physics

PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROLITHOGRAPHIC IMAGING

#21 | 2015-07-16
US20150198438A1
Physics

DIFFRACTIVE OPTICAL ELEMENT AND MEASURING METHOD

#22 | 2015-02-12
US20150042975A1
Physics

Projection exposure tool for microlithography and method for microlithographic imaging

#23 | 2013-09-26
US20130252146A1
Physics

Projection exposure tool for microlithography and method for microlithographic imaging

#24 | 2013-07-18
US20130182264A1
Physics

Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure

#25 | 2013-03-28
US20130077074A1
Physics

Microlithographic projection exposure apparatus

#26 | 2012-09-06
US20120224186A1
Physics

Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus

#27 | 2012-06-28
US20120160007A1
Physics

Method and calibration mask for calibrating a position measuring apparatus

#28 | 2012-04-19
US20120092637A1
Physics

Microlithographic projection exposure apparatus

#29 | 2010-08-12
US20100201959A1
Physics

Projection objective for microlithography

#30 | 2010-07-15
US20100177321A1
Physics

Optical element and method of calibrating a measuring apparatus comprising a wave shaping structure

#31 | 2010-06-03
US20100134768A1
Physics

PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY

#32 | 2009-10-20
US12197035
-

Optical system, method of manufacturing an optical system and method of manufacturing an optical element

#33 | 2009-03-19
US20090073398A1
Physics

Microlithographic projection exposure apparatus

#34 | 2008-06-12
US20080137090A1
Physics

Hologram and method of manufacturing an optical element using a hologram

#35 | 2006-12-07
US20060274325A1
Physics

Method of qualifying a diffraction grating and method of manufacturing an optical element

#36 | 2006-06-13
US10845251
-

Method of manufacturing an optical element using a hologram

#37 | 2005-06-09
US20050123840A1
Physics

Mask for use in a microlithographic projection exposure apparatus

InventorID:

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