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Inventor profile of:

Michael Layh

City:

Altusried

Country:

Germany

Published Applications:

Last publication date:

2023-01-05

Top Assignees for applications by Michael Layh

The entities that hold a legal rights for patent applications filed by inventor Layh Michael:

Carl Zeiss SMT GmbH 18 Oberkochen, Germany
Hochschule für angewandte Wissenschaften Kempten Körperschaft des öffentlichen Rechts 1 Kempten, Germany

Recent patent applications by Layh Michael

Michael Layh from Altusried, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-01-05

US20230003514A1

Physics

Confocal measuring apparatus for 3D measurement of an object surface

#2 | 2021-03-25

US20210086250A1

Performing operations; transporting

METHOD FOR OPERATING A PROCESSING INSTALLATION WITH A MOVABLE PUNCH

#3 | 2018-11-22

US20180335702A1

Physics

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#4 | 2018-08-30

US20180246415A1

Physics

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#5 | 2017-12-07

US20170351183A1

Physics

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#6 | 2016-09-15

US20160266502A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#7 | 2016-06-30

US20160187789A1

Physics

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#8 | 2016-03-17

US20160077446A1

Physics

Illumination system for a microlithographic projection exposure apparatus

#9 | 2015-10-22

US20150300807A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#10 | 2015-07-02

US20150185621A1

Physics

Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus

#11 | 2015-06-25

US20150177623A1

Physics

Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation

#12 | 2014-08-28

US20140240686A1

Physics

Arrangement of a mirror

#13 | 2014-08-21

US20140233006A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#14 | 2014-08-14

US20140226141A1

Physics

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

#15 | 2014-07-31

US20140211188A1

Physics

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#16 | 2014-06-26

US20140176930A1

Physics

Microlithographic illumination system

#17 | 2013-10-17

US20130271749A1

Physics

Method for measuring an optical system

#18 | 2013-09-26

US20130250264A1

Physics

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#19 | 2013-07-11

US20130176546A1

Mechanical engineering

Illumination optical unit with a movable filter element

#20 | 2013-06-13

US20130148092A1

Physics

Illumination system for a microlithographic projection exposure apparatus

#21 | 2013-03-28

US20130077076A1

Physics

Microlithography illumination optical system and microlithography projection exposure apparatus including same

InventorID:

163084 ⎘