Dresden
Germany
13
2017-05-18
The entities that hold a legal rights for patent applications filed by inventor Hotzel Arthur:
Arthur Hotzel from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Methods, apparatus, and systems for minimizing defectivity in top-coat-free lithography and improving reticle CD uniformity
#2 | 2017-05-04In-situ contactless monitoring of photomask pellicle degradation
#3 | 2016-12-29Methods including a processing of wafers and spin coating tool
#4 | 2016-06-23Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques
#5 | 2014-09-18Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques
#6 | 2014-09-04Reticle defect correction by second exposure
#7 | 2014-07-03Asymmetric reticle heating of multilayer reticles eliminated by dummy exposures and related methods
#8 | 2013-08-01Reticle defect correction by second exposure
#9 | 2013-03-28Reticle defect correction by second exposure
#10 | 2013-03-28Lithographic CD correction by second exposure
#11 | 2013-03-28Lithographic CD correction by second exposure
#12 | 2012-06-07Mechanical fixture of pellicle to lithographic photomask
#13 | 2012-06-07Vapor clean for haze and particle removal from lithographic photomasks
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