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Inventor profile of:

James W. Thackeray

City:

Braintree, Massachusetts

Country:

United States

Published Applications:

58

Last publication date:

2023-07-06

Top Assignees for applications by James W. Thackeray

The entities that hold a legal rights for patent applications filed by inventor Thackeray James W.:

Rohm and Haas Electronic Materials LLC 35 Marlborough, MA United States
Shipley Company, L.L.C. 11 Marlborough, MA United States
THE TEXAS A&M UNIVERSITY SYSTEM 5 College Station, TX United States
DOW GLOBAL TECHNOLOGIES LLC 4 Midland, MI United States
The University of Queensland 3 St. Lucia, Australia
Shipley 2 Marlborough, MA United States
DuPont Electronic Materials International, LLC 2 Marlborough, MA United States
Rohm and Haas Electronics Materials LLC 2 Marlborough, MA United States
Rohm and Haas Electronic Materials LLC 1 Marborough, MA United States
Rohm and Hass Electronic Materials, L.L.C. 1 Marlborough, MA United States

Recent patent applications by Thackeray James W.

James W. Thackeray from Braintree, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2023-07-06

US20230212112A1

Chemistry; metallurgy

Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

#2 | 2022-05-05

US20220137506A1

Photoresist compositions and pattern formation methods

#3 | 2022-03-24

US20220091506A1

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

#4 | 2022-01-20

US20220019143A1

Photoresist compositions and pattern formation methods

#5 | 2021-04-15

US20210108065A1

Chemistry; metallurgy

POLYMERS AND PHOTORESIST COMPOSITIONS

#6 | 2020-07-09

US20200218149A1

Iodine-containing polymers for chemically amplified resist compositions

#7 | 2019-07-25

US20190227433A1

ACID GENERATORS AND PHOTORESISTS COMPRISING SAME

#8 | 2019-05-23

US20190155152A1

Iodine-containing photoacid generators and compositions comprising the same

#9 | 2018-12-20

US20180362752A1

Chemistry; metallurgy

Iodine-containing polymers for chemically amplified resist compositions

#10 | 2018-10-04

US20180284605A1

Acid-cleavable monomer and polymers including the same

#11 | 2018-09-06

US20180252645A1

COPOLYMER AND ASSOCIATED LAYERED ARTICLE, AND DEVICE-FORMING METHOD

#12 | 2017-09-14

US20170261853A1

NANOPARTICLE - POLYMER RESISTS

#13 | 2017-08-31

US20170248844A1

Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

#14 | 2017-02-09

US20170037178A1

Chemistry; metallurgy

Block copolymer and associated photoresist composition and method of forming an electronic device

#15 | 2017-02-09

US20170037171A1

Chemistry; metallurgy

Copolymer and associated layered article, and device-forming method

#16 | 2017-02-02

US20170031244A1

Nanoparticle-polymer resists

#17 | 2016-06-30

US20160189953A1

Methods of forming electronic devices including filling porous features with a polymer

#18 | 2016-06-30

US20160185984A1

Chemistry; metallurgy

PORE-FILL COMPOSITIONS

#19 | 2016-04-14

US20160103392A1

Photoresist composition and associated method of forming an electronic device

#20 | 2016-04-14

US20160103391A1

Photoresist composition and associated method of forming an electronic device

#21 | 2016-04-14

US20160102158A1

Chemistry; metallurgy

Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

#22 | 2016-04-14

US20160102157A1

Chemistry; metallurgy

Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

#23 | 2016-01-07

US20160002199A1

Chemistry; metallurgy

Acid generators and photoresists comprising same

#24 | 2015-06-25

US20150177615A1

Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device

#25 | 2015-06-25

US20150177614A1

Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device

#26 | 2015-06-25

US20150177613A1

Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device

#27 | 2015-03-12

US20150072292A1

Self-assembled structures, method of manufacture thereof and articles comprising the same

#28 | 2015-03-12

US20150072291A1

Chemistry; metallurgy

Self-assembled structures, method of manufacture thereof and articles comprising the same

#29 | 2014-08-28

US20140242521A1

Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic device

#30 | 2014-07-03

US20140186767A1

Acid generators and photoresists comprising same

#31 | 2014-05-22

US20140142252A1

Chemistry; metallurgy

SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME

#32 | 2014-05-22

US20140142249A1

Chemistry; metallurgy

Self-assembled structures, method of manufacture thereof and articles comprising the same

#33 | 2014-05-22

US20140141376A1

Self-assembled structures, method of manufacture thereof and articles comprising the same

#34 | 2014-05-22

US20140141375A1

Self-assembled structures, method of manufacture thereof and articles comprising the same

#35 | 2014-03-20

US20140080062A1

PHOTORESISTS COMPRISING MULTIPLE ACID GENERATOR COMPOUNDS

#36 | 2014-03-20

US20140080058A1

Acid generators and photoresists comprising same

#37 | 2013-08-15

US20130209934A1

Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom

#38 | 2013-03-28

US20130078569A1

Chemistry; metallurgy

Calixarene and photoresist composition comprising same

#39 | 2012-07-05

US20120171616A1

Polymerizable photoacid generators

#40 | 2012-06-07

US20120141939A1

Chemistry; metallurgy

Photoacid generators

#41 | 2012-05-24

US20120129105A1

Photosensitive copolymer and photoresist composition

#42 | 2011-09-29

US20110236823A1

Polymers and photoresist compositions

#43 | 2011-06-30

US20110159429A1

Photosensitive compositions

#44 | 2009-09-03

US20090220888A1

Dyed photoresists and methods and articles of manufacture comprising same

#45 | 2008-10-09

US20080248426A1

Antihalation compositions

#46 | 2008-08-28

US20080206671A1

Polymers and photoresist compositions

#47 | 2007-08-02

US20070178406A1

Coating compositions for use with an overcoated photoresist

#48 | 2007-04-17

US10418740

Solvents and photoresist compositions for 193 nm imaging

#49 | 2007-02-22

US20070042289A1

Coating compositions for use with an overcoated photoresist

#50 | 2006-12-12

US8726613

Dyed photoresists and methods and articles of manufacture comprising same

#51 | 2006-10-12

US20060228647A1

Photoresist composition

#52 | 2006-09-14

US20060204892A1

Dyed photoresists and methods and articles of manufacture comprising same

#53 | 2006-06-13

US10783631

Radiation sensitive compositions and methods

#54 | 2006-05-25

US20060110682A1

Antihalation compositions

#55 | 2006-04-11

US10457282

Photoresist compositions

#56 | 2006-03-21

US10832651

Antihalation compositions

#57 | 2006-03-09

US20060051706A1

Radiation sensitive compositions and methods

#58 | 2005-01-27

US20050019705A1

Thick film photoresists and methods for use thereof

InventorID:

165834 ⎘