New Milford, Connecticut
United States
19
2016-06-02
The entities that hold a legal rights for patent applications filed by inventor Minsek David W.:
David W. Minsek from New Milford, US has applied for patents for these inventions. The list has both pending applications and granted patents:
PHOTORESIST REMOVAL
#2 | 2015-09-17Electroplating of metals on conductive oxide substrates
#3 | 2015-04-02Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition
#4 | 2015-01-01Oxidizing aqueous cleaner for the removal of post-etch residues
#5 | 2014-07-31Photoresist removal
#6 | 2013-03-28Light induced plating of metals on silicon photovoltaic cells
#7 | 2012-11-29Photoresist removal
#8 | 2011-11-10Light induced plating of metals on silicon photovoltaic cells
#9 | 2011-08-04Oxidizing aqueous cleaner for the removal of post-etch residues
#10 | 2010-07-01LIQUID CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES
#11 | 2010-05-06METHODS FOR STRIPPING MATERIAL FOR WAFER RECLAMATION
#12 | 2009-08-27Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings
#13 | 2009-08-27Oxidizing aqueous cleaner for the removal of post-etch residues
#14 | 2009-07-30DENSE FLUID COMPOSITIONS FOR REMOVAL OF HARDENED PHOTORESIST, POST-ETCH RESIDUE AND/OR BOTTOM ANTI-REFLECTIVE COATING
#15 | 2009-02-05COMPOSITION AND METHOD FOR SELECTIVELY ETCHING GATE SPACER OXIDE MATERIAL
#16 | 2008-10-02Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition
#17 | 2008-03-06SUPERCRITICAL FLUID CLEANING OF SEMICONDUCTOR SUBSTRATES
#18 | 2006-07-13Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings
#19 | 2006-03-23Composition and process for ashless removal of post-etch photoresist and/or bottom anti-reflective material on a substrate
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