Runchen Fang

City:

Shanghai

Country:

China

Published Applications:

Last publication date:

2014-03-27

Top Assignees for applications by Runchen Fang

The entities that hold a legal rights for patent applications filed by inventor Fang Runchen:

Runchen Fang from Shanghai, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

COMPOUND DIELECTRIC ANTI-COPPER-DIFFUSION BARRIER LAYER FOR COPPER CONNECTION AND MANUFACTURING METHOD THEREOF

Method for cleaning and passivating gallium arsenide surface autologous oxide and depositing AL203 dielectric

METHOD FOR DEPOSITING A GATE OXIDE AND A GATE ELECTRODE SELECTIVELY

METHOD FOR MANUFACTURING A FLEXIBLE TRANSPARENT 1T1R STORAGE UNIT BASED ON A COMPLETELY LOW-TEMPERATURE PROCESS

InventorID:

166344 ⎘