Brookline, Massachusetts
United States
38
2020-02-13
The entities that hold a legal rights for patent applications filed by inventor Kaim Robert:
Robert Kaim from Brookline, US has applied for patents for these inventions. The list has both pending applications and granted patents:
CARBON MATERIALS FOR CARBON IMPLANTATION
#2 | 2017-11-16METHOD AND APPARATUS FOR ENHANCED LIFETIME AND PERFORMANCE OF ION SOURCE IN AN ION IMPLANTATION SYSTEM
#3 | 2017-03-09Carbon materials for carbon implantation
#4 | 2016-07-21Silicon implantation in substrates and provision of silicon precursor compositions therefor
#5 | 2016-02-18ENRICHED SILICON PRECURSOR COMPOSITIONS AND APPARATUS AND PROCESSES FOR UTILIZING SAME
#6 | 2016-02-11FLUID STORAGE AND DISPENSING SYSTEM INCLUDING DYNAMIC FLUID MONITORING OF FLUID STORAGE AND DISPENSING VESSEL
#7 | 2016-01-14Isotopically-enriched boron-containing compounds, and methods of making and using same
#8 | 2015-12-10ION IMPLANTATION SYSTEM AND METHOD
#9 | 2015-08-13Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
#10 | 2015-04-16Medium current ribbon beam for ion implantation
#11 | 2014-11-20Ion implantation system and method
#12 | 2014-11-06Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
#13 | 2014-10-30Enriched silicon precursor compositions and apparatus and processes for utilizing same
#14 | 2014-04-03Isotopically-enriched boron-containing compounds, and methods of making and using same
#15 | 2014-02-13Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel
#16 | 2013-10-10Enriched silicon precursor compositions and apparatus and processes for utilizing same
#17 | 2013-09-26ION IMPLANTER SYSTEM INCLUDING REMOTE DOPANT SOURCE, AND METHOD COMPRISING SAME
#18 | 2013-08-15Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
#19 | 2013-05-30Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
#20 | 2013-03-28CARBON MATERIALS FOR CARBON IMPLANTATION
#21 | 2012-12-13Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
#22 | 2012-10-04Ion implantation system and method
#23 | 2012-06-07Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
#24 | 2012-05-03Isotopically-enriched boron-containing compounds, and methods of making and using same
#25 | 2012-03-08Ion source cleaning in semiconductor processing systems
#26 | 2011-10-27ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS
#27 | 2011-10-20Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel
#28 | 2011-06-30Isotopically-enriched boron-containing compounds, and methods of making and using same
#29 | 2011-04-28Isotopically-enriched boron-containing compounds, and methods of making and using same
#30 | 2011-03-17Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
#31 | 2011-01-27CARBON MATERIALS FOR CARBON IMPLANTATION
#32 | 2010-06-24Cleaning of semiconductor processing systems
#33 | 2010-05-06METHOD OF FORMING ULTRA-SHALLOW JUNCTIONS FOR SEMICONDUCTOR DEVICES
#34 | 2009-04-16NOVEL METHODS FOR CLEANING ION IMPLANTER COMPONENTS
#35 | 2008-11-13Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel
#36 | 2008-10-09Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
#37 | 2008-09-11Delivery of Low Pressure Dopant Gas to a High Voltage Ion Source
#38 | 2006-04-27Methods for cleaning ion implanter components
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