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Inventor profile of:

Eun-Mi CHOI

City:

Daejeon

Country:

South Korea

Published Applications:

Last publication date:

2024-01-25

Top Assignees for applications by Eun-Mi CHOI

The entities that hold a legal rights for patent applications filed by inventor CHOI Eun-Mi:

LG CHEM, LTD. 5 Seoul, South Korea
LOTTE CHEMICAL CORPORATION 3 Seoul, South Korea

Recent patent applications by CHOI Eun-Mi

Eun-Mi CHOI from Daejeon, KR has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-01-25

US20240030462A1

Electricity

METHOD FOR PRODUCING ELECTROLYTE FOR VANADIUM REDOX FLOW BATTERY

#2 | 2020-07-09

US20200220186A1

Electricity

METHOD FOR CONTROLLING OPERATION OF CHEMICAL FLOW BATTERY

#3 | 2019-07-11

US20190214652A1

Electricity

SLURRY COMPOSITION FOR PRODUCING ELECTRODE FOR REDOX FLOW BATTERY, AND METHOD FOR PRODUCING ELECTRODE FOR REDOX FLOW BATTERY

#4 | 2017-09-21

US20170271705A1

Electricity

Method for preparing cathode electrolyte for redox flow batteries, and redox flow battery

#5 | 2016-09-29

US20160285123A1

Electricity

Method for operating redox flow battery

#6 | 2012-10-25

US20120270399A1

Electricity

Slurry composition for CMP, and polishing method

#7 | 2012-04-19

US20120094490A1

Chemistry; metallurgy

Slurry for chemical mechanical polishing

#8 | 2010-07-22

US20100184291A1

Electricity

AQUEOUS SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD

#9 | 2010-06-17

US20100151684A1

Chemistry; metallurgy

SLURRY COMPOSITION FOR PRIMARY CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD

#10 | 2010-03-18

US20100068883A1

Chemistry; metallurgy

CMP slurry composition for forming metal wiring line

#11 | 2008-01-03

US20080003829A1

Electricity

Chemical mechanical polishing slurry

InventorID:

1666481 ⎘