Tomotaka TSUCHIMURA

City:

Yoshida-cho

Country:

Japan

Published Applications:

Last publication date:

2016-11-24

Top Assignees for applications by Tomotaka TSUCHIMURA

The entities that hold a legal rights for patent applications filed by inventor TSUCHIMURA Tomotaka:

FUJIFILM CORPORATION 1 Tokyo, Japan

Recent patent applications by TSUCHIMURA Tomotaka

Tomotaka TSUCHIMURA from Yoshida-cho, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-11-24

US20160342090A1

Physics

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTOMASK

InventorID:

1718924 ⎘