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Inventor profile of:

Takashi UCHIDA

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2024-12-05

Top Assignees for applications by Takashi UCHIDA

The entities that hold a legal rights for patent applications filed by inventor UCHIDA Takashi:

HOYA CORPORATION 15 Tokyo, Japan
HITACHI KOKUSAI ELECTRIC INC. 4 Tokyo, Japan
NATIONAL INSTITUTE OF RADIOLOGICAL SCIENCES 1 Chiba-shi, Japan
NATIONAL INSTITUTE OF RADIOLOGICAL SCIENCES 1 Chiba, Japan
HOYA CORPORATION 1 Shinjuku-ku, Tokyo, Japan
Hoya Electronics Singapore PTE. Ltd. 1 Singapore, Singapore
Chiyoda Technol Corporation 1 Tokyo, Japan

Recent patent applications by UCHIDA Takashi

Takashi UCHIDA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-12-05

US20240402589A1

Physics

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, MASK BLANK, AND TRANSFER MASK

#2 | 2024-06-06

US20240184193A1

Physics

MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#3 | 2023-03-09

US20230072220A1

Physics

MULTILAYER-REFLECTIVE-FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#4 | 2023-01-26

US20230025358A1

Physics

Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing method

#5 | 2022-09-08

US20220283490A1

Physics

SUBSTRATE WITH ELECTROCONDUCTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#6 | 2022-08-04

US20220244630A1

Physics

THIN FILM-ATTACHED SUBSTRATE, MULTILAYERED REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#7 | 2021-11-25

US20210364910A1

Physics

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#8 | 2021-04-15

US20210109436A1

Physics

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#9 | 2021-03-04

US20210063866A1

Physics

Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing method

#10 | 2020-12-03

US20200379338A1

Physics

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#11 | 2018-09-06

US20180252995A1

Physics

Mask blank, phase shift mask and method for manufacturing semiconductor device

#12 | 2018-06-28

US20180180987A1

Physics

Mask blank, phase-shift mask and method for manufacturing semiconductor device

#13 | 2017-03-16

US20170075210A1

Physics

Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device

#14 | 2017-03-09

US20170068155A1

Physics

Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device

#15 | 2016-12-29

US20160377975A1

Physics

Mask blank, phase-shift mask and method for manufacturing semiconductor device

#16 | 2008-06-26

US20080149835A1

Human necessities

Dosimeter fitting wear and body surface exposure dose distribution measuring method and apparatus using the same

#17 | 2006-12-12

US10245006

Radio signal receiving device

#18 | 2005-11-22

US10176252

Receiving apparatus

#19 | 2005-08-02

US9880958

Predistortion type distortion compensation apparatus

#20 | 2005-06-16

US20050128025A1

Electricity

Ultralow temperature low noise amplification apparatus

InventorID:

1750138 ⎘