Inventor profile of:

Ricky Marsh

City:

San Ramon, California

Country:

United States

Published Applications:

19

Last publication date:

2026-06-04

Top Assignees for applications by Ricky Marsh

The entities that hold a legal rights for patent applications filed by inventor Marsh Ricky:

Recent patent applications by Marsh Ricky

Ricky Marsh from San Ramon, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-06-04
US20260156736A1
Electricity

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

#2 | 2026-05-28
US20260150176A1
Electricity

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

#3 | 2026-04-30
US20260122752A1
Electricity

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

#4 | 2026-03-26
US20260089828A1
Electricity

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

#5 | 2025-07-03
US20250220801A1
Electricity

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

#6 | 2025-06-26
US20250212310A1
Electricity

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

#7 | 2025-06-19
US20250203749A1
Electricity

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

#8 | 2025-06-19
US20250203748A1
Electricity

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

#9 | 2025-03-27
US20250106976A1
Electricity

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

#10 | 2023-11-02
US20230354502A1
Electricity

Matchless plasma source for semiconductor wafer fabrication

#11 | 2022-04-14
US20220117074A1
Electricity

Matchless plasma source for semiconductor wafer fabrication

#12 | 2020-08-06
US20200253034A1
Electricity

Matchless plasma source for semiconductor wafer fabrication

#13 | 2019-07-11
US20190215942A1
Electricity

Matchless plasma source for semiconductor wafer fabrication

#14 | 2019-04-18
US20190116656A1
Electricity

Matchless plasma source for semiconductor wafer fabrication

#15 | 2016-06-09
US20160163569A1
Electricity

Faraday Shield Having Plasma Density Decoupling Structure Between TCP Coil Zones

#16 | 2015-08-20
US20150235810A1
Electricity

TCCT match circuit for plasma etch chambers

#17 | 2013-07-25
US20130186568A1
Electricity

Faraday shield having plasma density decoupling structure between TCP coil zones

#18 | 2013-05-30
US20130135058A1
Electricity

TCCT match circuit for plasma etch chambers

#19 | 2013-04-11
US20130087283A1
Electricity

Systems for cooling RF heated chamber components

InventorID:

182091 ⎘