Sodegaura-shi
Japan
10
2026-01-01
The entities that hold a legal rights for patent applications filed by inventor ONO Yosuke:
Yosuke ONO from Sodegaura-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING PELLICLE FILM
#2 | 2021-03-18Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicle
#3 | 2021-01-14Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor device
#4 | 2020-12-24Pellicle, exposure master, exposure device and method for manufacturing semiconductor device
#5 | 2019-05-02Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device
#6 | 2019-04-25PELLICLE FILM, PELLICLE FRAME BODY, PELLICLE, AND METHOD FOR MANUFACTURING PELLICLE
#7 | 2018-02-15Pellicle manufacturing method and method for manufacturing photomask with pellicle
#8 | 2017-10-05Pellicle film, pellicle frame, pellicle, and method for producing same
#9 | 2017-06-29Pellicle, pellicle production method and exposure method using pellicle
#10 | 2017-06-29Pellicle, production method thereof, exposure method
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