Ebenezer Eshun

City:

Plano, Texas

Country:

United States

Published Applications:

Last publication date:

2016-01-28

Top Assignees for applications by Ebenezer Eshun

The entities that hold a legal rights for patent applications filed by inventor Eshun Ebenezer:

Ebenezer Eshun from Plano, US has applied for patents for these inventions. The list has both pending applications and granted patents:

Silicide formation due to improved SiGe faceting

Silicide formation due to improved SiGe faceting

LASER ANNEALS FOR REDUCED DIODE LEAKAGE

Silicide formation due to improved SiGe faceting

Threshold mismatch and IDDQ reduction using split carbon co-implantation

Structure and method for integrating front end SiCr resistors in HiK metal gate technologies

InventorID:

193177 ⎘