Aalen
Germany
14
2026-06-04
The entities that hold a legal rights for patent applications filed by inventor BECKER Moritz:
Moritz BECKER from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
OPTICAL ASSEMBLY FOR AN EUV PROJECTION EXPOSURE APPARATUS, EUV PROJECTION EXPOSURE APPARATUS
#2 | 2025-09-04EUV OPTICS MODULE FOR AN EUV PROJECTION EXPOSURE APPARATUS
#3 | 2024-09-26APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED SURFACE OF A MIRROR MODULE, PROJECTION SYSTEM, ILLUMINATION SYSTEM AND PROJECTION EXPOSURE APPARATUS
#4 | 2024-09-12METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPTICAL ELEMENT
#5 | 2024-09-12ELECTRON MICROSCOPE FOR EXAMINING A SPECIMEN
#6 | 2024-07-25MULTI-MIRROR ARRAY
#7 | 2023-02-09Method for operating an EUV lithography apparatus, and EUV lithography apparatus
#8 | 2022-09-29Projection exposure apparatus having a device for determining the concentration of atomic hydrogen
#9 | 2020-06-11Method for operating an optical apparatus, and optical apparatus
#10 | 2020-05-28Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma
#11 | 2020-05-07Method for removing a contamination layer by an atomic layer etching process
#12 | 2019-08-08Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning
#13 | 2019-06-06Reflective optical element for EUV lithography
#14 | 2017-10-12Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and EUV-lithography system
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