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Inventor profile of:

Weimin Ma

City:

Beijing

Country:

China

Published Applications:

Last publication date:

2025-12-25

Top Assignees for applications by Weimin Ma

The entities that hold a legal rights for patent applications filed by inventor Ma Weimin:

Dongfang Jingyuan Electron Limited 6 Beijing, China
ZHONGKE JINGYUAN ELECTRON LIMITED, Beijing (CN) 1 Beijing, China
Zhongke Jingyuan Electron Limited 1 Beijing, China

Recent patent applications by Ma Weimin

Weimin Ma from Beijing, CN has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-12-25

US20250389793A1

Physics

METHOD AND SYSTEM FOR CALCULATING MAIN-LOOP PARAMETERS OF SLCC, AND READABLE MEDIUM

#2 | 2021-12-09

US20210382402A1

Physics

Overlay alignment mark and method for measuring overlay error

#3 | 2021-12-09

US20210382401A1

Physics

OVERLAY ALIGNMENT MARK, METHOD FOR MEASURING OVERLAY ERROR, AND METHOD FOR OVERLAY ALIGNMENT

#4 | 2021-08-12

US20210248005A1

Physics

Method and apparatus for data processing

#5 | 2020-07-30

US20200242746A1

Physics

Abnormality detection for periodic patterns

#6 | 2019-05-30

US20190163525A1

Physics

Method and apparatus for data processing

#7 | 2019-03-21

US20190088442A1

Electricity

Electron-Beam Inspection Systems with optimized throughput

#8 | 2018-03-01

US20180060702A1

Physics

Learning based defect classification

#9 | 2018-02-22

US20180053291A1

Physics

Reference image contour generation

#10 | 2018-01-18

US20180018542A1

Physics

Augmented automatic defect classification

#11 | 2017-10-19

US20170301509A1

Electricity

Multi-Stage/Multi-Chamber Electron-Beam Inspection System

#12 | 2017-10-19

US20170301508A1

Electricity

Multi-stage/multi-chamber electron-beam inspection system

InventorID:

2016372 ⎘