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Inventor profile of:

Hiroaki ASHIDATE

City:

Mie

Country:

Japan

Published Applications:

Last publication date:

2024-09-26

Top Assignees for applications by Hiroaki ASHIDATE

The entities that hold a legal rights for patent applications filed by inventor ASHIDATE Hiroaki:

KIOXIA CORPORATION 5 Tokyo, Japan
Toshiba Memory Corporation 4 Minato-ku, Japan
Toshiba Memory Corporation 4 Tokyo, Japan

Recent patent applications by ASHIDATE Hiroaki

Hiroaki ASHIDATE from Mie, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-09-26

US20240324195A1

Electricity

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

#2 | 2023-12-07

US20230397425A1

Electricity

SEMICONDUCTOR STORAGE DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR STORAGE DEVICE, AND SEMICONDUCTOR WAFER

#3 | 2023-12-07

US20230395499A1

Electricity

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

#4 | 2023-12-07

US20230395498A1

Electricity

SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOF

#5 | 2021-12-23

US20210398825A1

Electricity

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

#6 | 2021-08-26

US20210265181A1

Electricity

Substrate treatment apparatus and substrate treatment method

#7 | 2020-08-27

US20200273726A1

Electricity

Substrate treatment apparatus

#8 | 2019-12-19

US20190385867A1

Electricity

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#9 | 2019-08-22

US20190259639A1

Electricity

Semiconductor processing device

#10 | 2018-08-16

US20180233383A1

Electricity

SUBSTRATE TREATMENT APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

#11 | 2018-03-22

US20180082862A1

Electricity

Substrate processing device and method of manufacturing semiconductor device

#12 | 2017-10-26

US20170309501A1

Electricity

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

InventorID:

2023148 ⎘