Tobias HACKL

City:

Neusaess

Country:

Germany

Published Applications:

Last publication date:

2013-04-25

Top Assignees for applications by Tobias HACKL

The entities that hold a legal rights for patent applications filed by inventor HACKL Tobias:

Tobias HACKL from Neusaess, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Optical system for EUV lithography with a charged-particle source

InventorID:

204845 ⎘