Wolfgang SEITZ

City:

Rainau

Country:

Germany

Published Applications:

Last publication date:

2015-06-04

Top Assignees for applications by Wolfgang SEITZ

The entities that hold a legal rights for patent applications filed by inventor SEITZ Wolfgang:

Wolfgang SEITZ from Rainau, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

Illumination system of a microlithographic projection exposure apparatus comprising a depolarizing element

Optical system for EUV lithography with a charged-particle source

Illumination system of a microlithographic projection exposure apparatus

Illumination system of a microlithographic projection exposure apparatus

InventorID:

204846 ⎘