Oberkochen
Germany
46
2025-09-04
The entities that hold a legal rights for patent applications filed by inventor Dinger Udo:
Udo Dinger from Oberkochen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
EUV OPTICS MODULE FOR AN EUV PROJECTION EXPOSURE APPARATUS
#2 | 2024-07-25MULTI-MIRROR ARRAY
#3 | 2021-06-03Radiation source and device for feeding back emitted radiation to a laser source
#4 | 2020-06-04Reflective optical element for EUV lithography and method for adapting a geometry of a component
#5 | 2018-04-19Lithography apparatus and method for operating a lithography apparatus
#6 | 2016-12-29EUV-mirror, optical system with EUV-mirror and associated operating method
#7 | 2016-10-27Facet mirror for use in a projection exposure apparatus for microlithography
#8 | 2015-04-09Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and LPP X-ray source comprising a laser light source and such a beam guidance system
#9 | 2014-09-25EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method
#10 | 2013-10-10EUV lithography system
#11 | 2013-07-04Substrate for mirrors for EUV lithography
#12 | 2013-04-25METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
#13 | 2012-03-01EUV collector with cooling device
#14 | 2011-09-29ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY
#15 | 2011-03-17Illumination optics for EUV microlithography and related system and apparatus
#16 | 2011-01-20Projection illumination system for EUV microlithography
#17 | 2011-01-06ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS
#18 | 2011-01-06Facet mirror for use in a projection exposure apparatus for microlithography
#19 | 2010-09-16Bundle-guiding optical collector for collecting the emission of a radiation source
#20 | 2010-07-22METHOD FOR PRODUCING AN OPTICAL ELEMENT THROUGH A MOLDING PROCESS, OPTICAL ELEMENT PRODUCED ACCORDING TO THE METHOD, COLLECTOR, AND LIGHTING SYSTEM
#21 | 2010-01-14METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
#22 | 2009-12-24Illumination system particularly for microlithography
#23 | 2009-10-15Optical element with multiple primary light sources
#24 | 2009-03-19Illumination system particularly for microlithography
#25 | 2009-01-27Mirror for use in a projection exposure apparatus
#26 | 2009-01-15ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
#27 | 2008-06-05Illumination system particularly for microlithography
#28 | 2008-05-01High-Precision Optical Surface Prepared by Sagging from a Masterpiece
#29 | 2008-01-24Collector for an illumination system
#30 | 2007-07-05Projection system for EUV lithography
#31 | 2007-05-31Illumination system particularly for microlithography
#32 | 2007-03-29Projection system for EUV lithography
#33 | 2007-02-15Projection objective
#34 | 2006-12-19Projection system for EUV lithography
#35 | 2006-11-02Illumination system particularly for microlithography
#36 | 2006-10-10Method of manufacturing an optical element
#37 | 2006-07-18Reflecting device for electromagnetic waves
#38 | 2006-04-18Substrate material for X-ray optical components
#39 | 2006-03-09Projection system for EUV lithography
#40 | 2006-02-28Illumination system particularly for microlithography
#41 | 2006-01-10Projection system for EUV lithography
#42 | 2005-09-15Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm
#43 | 2005-06-07Microlithography reduction objective and projection exposure apparatus
#44 | 2005-04-28Illumination system particularly for microlithography
#45 | 2005-03-156-mirror microlithography projection objective
#46 | 2005-02-22Illumination system particularly for microlithography
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