Lauchheim
Germany
13
2026-03-12
The entities that hold a legal rights for patent applications filed by inventor Wiesner Stefan:
Stefan Wiesner from Lauchheim, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
METHOD OF TREATING A REFLECTIVE OPTICAL ELEMENT, REFLECTIVE OPTICAL ELEMENT AND OPTICAL ARRANGEMENT
#2 | 2019-08-08Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning
#3 | 2019-06-06Reflective optical element for EUV lithography
#4 | 2015-01-08Method and device for connecting an optical element to a frame
#5 | 2013-04-25METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
#6 | 2012-04-12METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM
#7 | 2011-11-17EUV lithography device and method for processing an optical element
#8 | 2011-03-10CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
#9 | 2011-02-24Cleaning module, EUV lithography device and method for the cleaning thereof
#10 | 2010-10-14Mirror for guiding a radiation bundle
#11 | 2010-03-25METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE
#12 | 2010-01-14METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
#13 | 2009-10-01Method and device for connecting an optical element to a frame
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