Essingen
Germany
39
2019-03-07
The entities that hold a legal rights for patent applications filed by inventor KRAEHMER Daniel:
Daniel KRAEHMER from Essingen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME
#2 | 2018-06-14PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
#3 | 2017-11-09MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#4 | 2017-07-06Microlithography projection objective
#5 | 2016-12-22Lithography projection objective, and a method for correcting image defects of the same
#6 | 2016-01-07Illumination system for an EUV lithography device and facet mirror therefor
#7 | 2015-06-18EUV light source for generating a usable output beam for a projection exposure apparatus
#8 | 2014-11-13Microlithography projection objective
#9 | 2014-11-06Lithography projection objective, and a method for correcting image defects of the same
#10 | 2014-10-30MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#11 | 2014-10-02MICROLITHOGRAPHY PROJECTION OBJECTIVE
#12 | 2014-09-18Optical system for a microlithographic projection exposure apparatus
#13 | 2014-07-10Collector
#14 | 2013-04-25Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask
#15 | 2012-09-20Combination stop for catoptric projection arrangement
#16 | 2012-01-26Lithography projection objective, and a method for correcting image defects of the same
#17 | 2011-09-29Projection objective of a microlithographic projection exposure apparatus
#18 | 2011-09-15Microlithographic projection exposure apparatus
#19 | 2011-03-24Optical system for microlithography
#20 | 2010-08-19PROJECTION OBJECTIVE FOR MICRLOLITHOGRAPHY HAVING AN OBSCURATED PUPIL
#21 | 2010-06-24Lithography projection objective, and a method for correcting image defects of the same
#22 | 2010-06-17METHODS FOR PRODUCING AN ANTIREFLECTION SURFACE ON AN OPTICAL ELEMENT, OPTICAL ELEMENT AND ASSOCIATED OPTICAL ARRANGEMENT
#23 | 2010-04-22High transmission, high aperture catadioptric projection objective and projection exposure apparatus
#24 | 2010-04-01PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
#25 | 2010-04-01Projection objective for microlithography with stray light compensation and related methods
#26 | 2009-12-10Optimization and matching of optical systems by use of orientation Zernike polynomials
#27 | 2009-11-19Projection objective of a microlithographic projection exposure apparatus
#28 | 2009-08-06METHOD FOR DESCRIBING A RETARDATION DISTRIBUTION IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#29 | 2009-05-07Microlithography projection objective
#30 | 2009-04-23Lithography projection objective, and a method for correcting image defects of the same
#31 | 2009-03-26Symmetrical objective having four lens groups for microlithography
#32 | 2009-01-22PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
#33 | 2009-01-22Combination stop for catoptric projection arrangement
#34 | 2008-12-04Microlithographic projection exposure apparatus
#35 | 2008-11-13Projection objective of a microlithographic projection exposure apparatus
#36 | 2008-09-04Method for determining intensity distribution in the image plane of a projection exposure arrangement
#37 | 2008-08-28Illumination system or projection lens of a microlithographic exposure system
#38 | 2008-06-19Lithography projection objective, and a method for correcting image defects of the same
#39 | 2008-04-17Microlithograph system
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