Ulm
Germany
48
2025-06-05
The entities that hold a legal rights for patent applications filed by inventor Weber Ulrich:
Ulrich Weber from Ulm, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
MICRO-OPTICAL ELEMENT
#2 | 2019-12-19Projection lighting system for semiconductor lithography with an improved heat transfer
#3 | 2018-04-12Beam reverser module and optical power amplifier having such a beam reverser module
#4 | 2018-01-25SUPPORT ELEMENTS FOR AN OPTICAL ELEMENT
#5 | 2017-12-07Positioning unit and apparatus for adjustment of an optical element
#6 | 2017-04-13Optical assembly, projection system, metrology system and EUV lithography apparatus
#7 | 2016-02-11Positioning unit and apparatus for adjustment of an optical element
#8 | 2015-12-24Actuators and microlithography projection exposure systems and methods using the same
#9 | 2015-11-26Beam reverser module and optical power amplifier having such a beam reverser module
#10 | 2015-11-05Support elements for an optical element
#11 | 2014-12-18Positioning unit and apparatus for adjustment of an optical element
#12 | 2013-10-31Positioning unit and apparatus for adjustment of an optical element
#13 | 2013-10-24Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
#14 | 2013-05-30Positioning unit and alignment device for an optical element
#15 | 2013-04-25Optical element module with minimized parasitic loads
#16 | 2012-06-21Holding arrangement for an optical element
#17 | 2012-06-14ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METHODS USING THE SAME
#18 | 2012-06-07Holding arrangement for an optical element
#19 | 2012-03-22Support elements for an optical element
#20 | 2012-01-26Positioning unit and alignment device for an optical element
#21 | 2011-08-18Imaging device in a projection exposure facility
#22 | 2011-06-02ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METHODS USING THE SAME
#23 | 2010-09-30Positioning unit and alignment device for an optical element
#24 | 2010-08-26Optical element module with minimized parasitic loads
#25 | 2009-10-01Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
#26 | 2009-06-04Imaging Device in a Projection Exposure Machine
#27 | 2009-02-12Imaging device in a projection exposure facility
#28 | 2008-07-24Replacement device for an optical element
#29 | 2008-07-24Imaging device in a projection exposure machine
#30 | 2007-12-04Imaging device in a projection exposure facility
#31 | 2007-09-27Holding and positioning apparatus for an optical element
#32 | 2007-09-20Support device for positioning an optical element
#33 | 2007-09-06Positioning unit and alignment device for an optical element
#34 | 2007-08-09Device for preventing the displacement of an optical element
#35 | 2007-06-28Optical element module
#36 | 2006-11-23Reflecting optical element with eccentric optical passageway
#37 | 2006-07-27Imaging device in a projection exposure machine
#38 | 2006-04-06Apparatus for positioning an optical element in a structure
#39 | 2006-03-21Apparatus for tilting a carrier for optical elements
#40 | 2006-01-19Objective, in particular a projection objective in microlithography
#41 | 2006-01-12Holding and positioning apparatus for an optical element
#42 | 2005-12-29Objective, especially a projection objective for microlithography
#43 | 2005-11-22Apparatus for positioning an optical element in a structure
#44 | 2005-11-10Device for holding a beam splitter element
#45 | 2005-09-01Objective with at least one optical element
#46 | 2005-05-26Device for manipulating the angular position of an object relative to a fixed structure
#47 | 2005-03-10Device for the low-deformation mounting of a rotationally asymmetric optical element
#48 | 2005-01-11Catadioptric objective
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