Jena
Germany
17
2023-07-13
The entities that hold a legal rights for patent applications filed by inventor Schaffer Dirk:
Dirk Schaffer from Jena, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
#2 | 2020-05-14Optical element for the beam guidance of imaging light in projection lithography
#3 | 2019-03-21Mounting arrangement for an optical imaging arrangement
#4 | 2017-12-14Moveably mounted component of projection exposure system, as well as device and method for movement limitation for same
#5 | 2017-07-06Optical arrangement of a microlithographic projection exposure apparatus
#6 | 2017-06-01Mirror module, in particular for a microlithographic projection exposure appararatus
#7 | 2016-04-21Optical Element Unit And Method Of Supporting An Optical Element
#8 | 2015-06-18Optical element unit for exposure processes
#9 | 2015-06-18Mirror arrangement for a lithography apparatus and method for producing the same
#10 | 2015-02-26Lithography apparatus and method for producing a mirror arrangement
#11 | 2014-03-06DEVICE FOR THE LOW-DEFORMATION REPLACEABLE MOUNTING OF AN OPTICAL ELEMENT
#12 | 2013-04-25Optical element module with minimized parasitic loads
#13 | 2012-11-29Optical arrangement in a microlithographic projection exposure apparatus
#14 | 2012-04-05Method for bonding bodies and composite body
#15 | 2012-02-23Optical element for UV or EUV lithography with coatings having optimized stress and thickness
#16 | 2010-08-26Optical element module with minimized parasitic loads
#17 | 2005-06-16Low-deformation support device of an optical element
207269 ⎘