Dresden
Germany
8
2014-09-18
The entities that hold a legal rights for patent applications filed by inventor Pfuetzner Ronny:
Ronny Pfuetzner from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Method of forming a semiconductor structure including a metal-insulator-metal capacitor
#2 | 2014-09-18METALLIZATION SYSTEMS OF SEMICONDUCTOR DEVICES COMPRISING A COPPER/SILICON COMPOUND AS A BARRIER MATERIAL
#3 | 2014-07-17Semiconductor device comprising metallization layers of reduced interlayer capacitance by reducing the amount of etch stop materials
#4 | 2013-04-25Methods of forming conductive structures in dielectric layers on an integrated circuit device
#5 | 2012-11-08Method of forming metal gates and metal contacts in a common fill process
#6 | 2012-09-06Semiconductor device comprising metallization layers of reduced interlayer capacitance by reducing the amount of etch stop materials
#7 | 2012-06-21Metallization systems of semiconductor devices comprising a copper/silicon compound as a barrier material
#8 | 2012-06-21Semiconductor Device Comprising a Contact Structure with Reduced Parasitic Capacitance
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