Munetoshi IRISAWA

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2020-01-09

Top Assignees for applications by Munetoshi IRISAWA

The entities that hold a legal rights for patent applications filed by inventor IRISAWA Munetoshi:

Munetoshi IRISAWA from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Photosensitive resin composition, etching method and plating method

Photosensitive resin composition and etching process

Method for electroconductive pattern formation

Method for forming resist pattern, method for producing circuit board, and circuit board

Method for Manufacturing Screen Printing Mask With Resin and Screen Printing Mask With Resin

Circuit board manufacturing method and circuit board

InventorID:

2117973 ⎘