Joetsu-shi
Japan
20
2026-02-26
The entities that hold a legal rights for patent applications filed by inventor Mitsui Ryo:
Ryo Mitsui from Joetsu-shi, JP has applied for patents for these inventions. The list has both pending applications and granted patents:
LAMINATE, PROCESS FOR MANUFACTURING LAMINATE, AND PATTERNING PROCESS
#2 | 2026-02-12COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS
#3 | 2026-01-29COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT
#4 | 2025-12-18BENZENESULFONIC ACID SALT COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
#5 | 2025-09-18POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS
#6 | 2025-07-24SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS
#7 | 2025-07-03Composition For Forming Silicon-Containing Anti-Reflective Film And Patterning Method
#8 | 2025-05-22Patterning Process
#9 | 2024-09-26Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning Process
#10 | 2023-10-19THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS
#11 | 2023-09-28COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS
#12 | 2020-07-09Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process
#13 | 2020-05-21Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process
#14 | 2020-04-16METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND
#15 | 2020-03-19PATTERNING PROCESS
#16 | 2019-04-18Silicon-containing compound, urethane resin, stretchable film, and method for forming the same
#17 | 2019-04-11Silicon-containing compound, urethane resin, stretchable film, and method for forming the same
#18 | 2019-02-28Sulfonium compound, resist composition, and patterning process
#19 | 2018-09-27Sulfonium salt, resist composition, and patterning process
#20 | 2018-03-01Sulfonium compound, resist composition, and patterning process
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