Jonathan G. Weis

City:

Bear, Delaware

Country:

United States

Published Applications:

Last publication date:

2023-09-21

Top Assignees for applications by Jonathan G. Weis

The entities that hold a legal rights for patent applications filed by inventor Weis Jonathan G.:

Jonathan G. Weis from Bear, US has applied for patents for these inventions. The list has both pending applications and granted patents:

CHEMICAL MECHANICAL POLISHING PADS FOR IMPROVED REMOVAL RATE AND PLANARIZATION

CHEMICAL MECHANICAL POLISHING PADS FOR IMPROVED REMOVAL RATE AND PLANARIZATION

Chemical mechanical polishing pads for improved removal rate and planarization

High planarization efficiency chemical mechanical polishing pads and methods of making

InventorID:

2138775 ⎘