Albany, New York
United States
10
2021-12-23
The entities that hold a legal rights for patent applications filed by inventor Ebrish Mona A.:
Mona A. Ebrish from Albany, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Dielectric retention and method of forming memory pillar
#2 | 2020-09-03Nanosheet transistor barrier for electrically isolating the substrate from the source or drain regions
#3 | 2020-06-04Semiconductor structures of more uniform thickness
#4 | 2019-10-24Structure and method for equal substrate to channel height between N and P fin-FETs
#5 | 2019-03-28Reducing series resistance between source and/or drain regions and a channel region
#6 | 2019-03-28Reducing series resistance between source and/or drain regions and a channel region
#7 | 2018-07-12Structure and method for equal substrate to channel height between N and P fin-FETs
#8 | 2018-04-05Separate N and P fin etching for reduced CMOS device leakage
#9 | 2017-07-18Separate N and P fin etching for reduced CMOS device leakage
#10 | 2017-05-30Contained punch through stopper for CMOS structures on a strain relaxed buffer substrate
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