Aalen
Germany
51
2022-07-28
The entities that hold a legal rights for patent applications filed by inventor FREIMANN Rolf:
Rolf FREIMANN from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
OPTICAL SYSTEM
#2 | 2022-07-14Measuring apparatus for interferometrically determining a surface shape
#3 | 2022-02-10METHOD FOR PRODUCING OR SETTING A PROJECTION EXPOSURE APPARATUS
#4 | 2021-01-28Method and assembly for analysing the wavefront effect of an optical system
#5 | 2020-07-09Wafer holding device and projection microlithography system
#6 | 2019-11-21OPTICAL SYSTEM
#7 | 2019-05-02PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT DEVICE
#8 | 2019-02-14Method for aligning a mirror of a microlithographic projection exposure apparatus
#9 | 2018-04-12Optical system
#10 | 2018-03-15Method for producing a lens for a lithography apparatus, and measurement system
#11 | 2018-01-25Projection exposure system for microlithography with a measurement device
#12 | 2017-10-05OPTICAL DEVICE
#13 | 2017-01-26Method for aligning a mirror of a microlithographic projection exposure apparatus
#14 | 2016-08-25Optical imaging device with image defect determination
#15 | 2016-07-07Projection objective of a microlithographic projection exposure apparatus
#16 | 2015-07-30Projection exposure system for microlithography with a measurement device
#17 | 2014-05-01Measuring system
#18 | 2014-04-17Projection arrangement
#19 | 2014-03-20METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE BASED ON COMPUTATIONALLY COMBINED SURFACE REGION MEASUREMENTS AND INTERFEROMETRIC MEASURING DEVICE
#20 | 2014-01-23Optical device
#21 | 2014-01-16Optical imaging device with image defect determination
#22 | 2013-12-19Projection exposure tool for microlithography with a radiation detector detecting radiation with high resolution over a two-dimensional area
#23 | 2013-10-31Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective
#24 | 2013-09-19Projection objective of a microlithographic projection exposure apparatus designed for EUV and a method of optically adjusting a projection objective
#25 | 2013-07-25Imaging optical system for microlithography
#26 | 2013-05-02Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
#27 | 2012-10-04MEASUREMENT OF AN IMAGING OPTICAL SYSTEM BY SUPERPOSITION OF PATTERNS
#28 | 2012-09-13Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device
#29 | 2012-06-07Optical system, in particular in a microlithographic projection exposure apparatus
#30 | 2012-05-24Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surface
#31 | 2011-07-07Optical imaging device with image defect determination
#32 | 2011-01-20Projection exposure system for microlithography with a measurement device
#33 | 2010-07-15Optical element and method of calibrating a measuring apparatus comprising a wave shaping structure
#34 | 2010-01-28Projection exposure tool for microlithography with a measuring apparatus and method for measuring an irradiation strength distribution
#35 | 2009-09-17Method of aligning an optical system
#36 | 2009-05-21Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surface
#37 | 2009-04-16Projection exposure system and use thereof
#38 | 2009-01-01Projection illumination system
#39 | 2008-07-22Method and means for determining the shape of a rough surface of an object
#40 | 2008-04-24ILLUMINATION DEVICE AND MASK FOR MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEM, AND RELATED METHODS
#41 | 2008-03-11Method of processing an optical element using an interferometer having an aspherical lens that transforms a first spherical beam type into a second spherical beam type
#42 | 2007-10-25Refractive projection objective
#43 | 2006-12-26Method for calibrating a radius test bench
#44 | 2006-11-07Method of manufacturing an optical system
#45 | 2006-05-23Method for calibrating an interferometer apparatus, for qualifying an optical surface, and for manufacturing a substrate having an optical surface
#46 | 2006-05-11Projection exposure system and method of manufacturing a miniaturized device
#47 | 2005-12-15Method of calibrating an interferometer and method of manufacturing an optical element
#48 | 2005-10-20Refractive projection objective
#49 | 2005-10-13Method for measuring and manufacturing an optical element and optical apparatus
#50 | 2005-10-13Method of manufacturing an optical component
#51 | 2005-09-06Method for absolute calibration of an interferometer
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