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Inventor profile of:

Satoshi Okabe

City:

Tokyo

Country:

Japan

Published Applications:

8

Last publication date:

2014-07-03

Top Assignees for applications by Satoshi Okabe

The entities that hold a legal rights for patent applications filed by inventor Okabe Satoshi:

Mitsubishi Gas Chemical Company, Inc. 5 Tokyo, Japan
OLYMPUS CORPORATION 1 Tokyo, Japan
MITSUBISHI GAS CHEMICAL COMPANY, INC. 1 Chiyoda-ku, Tokyo, Japan
Mitsubishi Gas Chemical Company, Inc. 1 Chiyoda-ku, Japan

Recent patent applications by Okabe Satoshi

Satoshi Okabe from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2014-07-03

US20140186996A1

Chemistry; metallurgy

Etchant and etching process for oxides containing at least indium and gallium

#2 | 2014-06-12

US20140162403A1

Chemistry; metallurgy

Etching solution for copper/molybdenum-based multilayer thin film

#3 | 2014-05-15

US20140131615A1

Chemistry; metallurgy

Etching solution for copper or a compound comprised mainly of copper

#4 | 2013-05-02

US20130105729A1

Chemistry; metallurgy

Etching liquid for film of multilayer structure containing copper layer and molybdenum layer

#5 | 2012-12-20

US20120319033A1

ETCHING SOLUTION FOR MULTILAYER THIN FILM HAVING COPPER LAYER AND MOLYBDENUM LAYER CONTAINED THEREIN

#6 | 2011-10-06

US20110240592A1

TEXTURE PROCESSING LIQUID FOR TRANSPARENT CONDUCTIVE FILM MAINLY COMPOSED OF ZINC OXIDE AND METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM HAVING RECESSES AND PROJECTIONS

#7 | 2008-12-04

US20080297647A1

Image pickup device

#8 | 2005-09-01

US20050190322A1

Chemistry; metallurgy

Etching composition for laminated film including reflective electrode and method for forming laminated wiring structure

InventorID:

217290 ⎘