Shanghai
China
27
2025-06-26
The entities that hold a legal rights for patent applications filed by inventor JIANG LI:
LI JIANG from Shanghai, CN has applied for patents for these inventions. The list has both pending applications and granted patents:
URINAL
#2 | 2025-01-23Toilet
#3 | 2023-10-26Magnetic Suspension Drain
#4 | 2023-02-02Pruning method based on crossbar architecture and system thereof
#5 | 2021-12-30Toilet bowl flush device
#6 | 2021-02-11Semiconductor structure and formation method thereof
#7 | 2021-02-04Semiconductor device and fabrication method thereof
#8 | 2018-11-15Semiconductor structure and fabrication method thereof
#9 | 2018-10-11Semiconductor structure and fabrication method thereof
#10 | 2016-02-11Semiconductor device manufacturing method and related semiconductor wafer
#11 | 2015-11-26Preventing over-polishing of poly gate in metal-gate CMP
#12 | 2015-10-22Method of Forming Tungsten Nitride Layer of Tungsten Gate
#13 | 2014-11-13Semiconductor device with an aluminum alloy gate
#14 | 2013-05-02Semiconductor device having metal alloy gate and method for manufacturing the same
#15 | 2012-10-25Polishing method and method for forming a gate
#16 | 2012-09-27Fixed abrasive pad and method for forming the same
#17 | 2012-07-26Polishing method and polishing device
#18 | 2012-07-05Chemical mechanical polishing device and polishing element
#19 | 2012-06-28POLISHING METHOD
#20 | 2012-06-28Method for cleaning a polishing pad
#21 | 2012-06-28Method for fabricating a high-K metal gate MOS
#22 | 2012-06-07Polishing apparatus and exception handling method thereof
#23 | 2012-06-07Method for forming metal gate and MOS transistor
#24 | 2011-05-19Method for fabricating an enlarged oxide-nitride-oxide structure for NAND flash memory semiconductor devices
#25 | 2008-05-29Polishing Pad and a Chemical-Mechanical Polishing Method
#26 | 2008-05-29Polishing Pad and a Chemical-Mechanical Polishing Method
#27 | 2007-10-18Method and structure for self aligned formation of a gate polysilicon layer
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