🔗 Permalink

Inventor profile of:

Ryo ISHIMARU

City:

Tokyo

Country:

Japan

Published Applications:

1

Last publication date:

2018-05-03

Top Assignees for applications by Ryo ISHIMARU

The entities that hold a legal rights for patent applications filed by inventor ISHIMARU Ryo:

Hitach High-Technologies Corporation 1 Tokyo, Japan

Recent patent applications by ISHIMARU Ryo

Ryo ISHIMARU from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-05-03

US20180122651A1

Plasma etching method

InventorID:

2180423 ⎘