Inventor profile of:

Carsten Schmidt

City:

Jena

Country:

Germany

Published Applications:

12

Last publication date:

2025-03-13

Top Assignees for applications by Carsten Schmidt

The entities that hold a legal rights for patent applications filed by inventor Schmidt Carsten:

Recent patent applications by Schmidt Carsten

Carsten Schmidt from Jena, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-03-13
US20250086366A1
Physics

COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MODEL OF A PHOTOLITHOGRAPHY MASK USING A MACHINE LEARNING MODEL

#2 | 2025-03-13
US20250085640A1
Physics

COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MODEL OF A PHOTOLITHOGRAPHY MASK USING A MACHINE LEARNING MODEL

#3 | 2024-08-22
US20240280912A1
Physics

METHOD FOR MEASURING PHOTOMASKS FOR SEMICONDUCTOR LITHOGRAPHY

#4 | 2024-08-08
US20240264536A1
Physics

APPARATUS AND METHOD FOR ANALYZING AN ELEMENT OF A PHOTOLITHOGRAPHY PROCESS WITH THE AID OF A TRANSFORMATION MODEL

#5 | 2023-12-21
US20230408929A1
Physics

Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process

#6 | 2021-05-27
US20210158215A1
Physics

Method and device for evaluating a statistically distributed measured value in the examination of an element of a photolithography process

#7 | 2021-03-11
US20210073969A1
Physics

Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process

#8 | 2020-12-31
US20200410656A1
Physics

Method, computer program and apparatus for determining a quality of a mask of a photolithography apparatus

#9 | 2020-12-31
US20200409255A1
Physics

Method and device for superimposing at least two images of a photolithographic mask

#10 | 2019-11-21
US20190354019A1
Physics

Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model

#11 | 2019-01-24
US20190026578A1
Physics

Method for correcting the distortion of a first imaging optical unit of a first measurement system

#12 | 2018-05-10
US20180129131A1
Physics

Method and device for generating a reference image in the characterization of a mask for microlithography

InventorID:

2185542 ⎘