Jena
Germany
12
2025-03-13
The entities that hold a legal rights for patent applications filed by inventor Schmidt Carsten:
Carsten Schmidt from Jena, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MODEL OF A PHOTOLITHOGRAPHY MASK USING A MACHINE LEARNING MODEL
#2 | 2025-03-13COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MODEL OF A PHOTOLITHOGRAPHY MASK USING A MACHINE LEARNING MODEL
#3 | 2024-08-22METHOD FOR MEASURING PHOTOMASKS FOR SEMICONDUCTOR LITHOGRAPHY
#4 | 2024-08-08APPARATUS AND METHOD FOR ANALYZING AN ELEMENT OF A PHOTOLITHOGRAPHY PROCESS WITH THE AID OF A TRANSFORMATION MODEL
#5 | 2023-12-21Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process
#6 | 2021-05-27Method and device for evaluating a statistically distributed measured value in the examination of an element of a photolithography process
#7 | 2021-03-11Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process
#8 | 2020-12-31Method, computer program and apparatus for determining a quality of a mask of a photolithography apparatus
#9 | 2020-12-31Method and device for superimposing at least two images of a photolithographic mask
#10 | 2019-11-21Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model
#11 | 2019-01-24Method for correcting the distortion of a first imaging optical unit of a first measurement system
#12 | 2018-05-10Method and device for generating a reference image in the characterization of a mask for microlithography
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