Hiroki HATTA

City:

Toyama

Country:

Japan

Published Applications:

Last publication date:

2025-10-02

Top Assignees for applications by Hiroki HATTA

The entities that hold a legal rights for patent applications filed by inventor HATTA Hiroki:

KOKUSAI ELECTRIC CORPORATION 6 Tokyo, Japan
HITACHI KOKUSAI ELECTRIC INC. 1 Tokyo, Japan

Recent patent applications by HATTA Hiroki

Hiroki HATTA from Toyama, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-10-02

US20250305125A1

Chemistry; metallurgy

SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM

#2 | 2025-07-03

US20250215568A1

Chemistry; metallurgy

Substrate Processing Apparatus, Gas Supply Assembly, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-Readable Recording Medium

#3 | 2025-01-09

US20250014894A1

Electricity

Substrate Processing Method, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-transitory Computer-readable Recording Medium

#4 | 2023-12-21

US20230407472A1

Chemistry; metallurgy

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM

#5 | 2023-03-23

US20230091850A1

Chemistry; metallurgy

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

#6 | 2021-10-28

US20210332477A1

Chemistry; metallurgy

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM

#7 | 2021-04-29

US20210123137A1

Chemistry; metallurgy

Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device

#8 | 2018-06-21

US20180171467A1

Chemistry; metallurgy

Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium

#9 | 2017-11-30

US20170345645A1

Electricity

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

InventorID:

2220583 ⎘