Inventor profile of:

David D. Bernhard

City:

Kooskia, Idaho

Country:

United States

Published Applications:

12

Last publication date:

2016-06-02

Top Assignees for applications by David D. Bernhard

The entities that hold a legal rights for patent applications filed by inventor Bernhard David D.:

Recent patent applications by Bernhard David D.

David D. Bernhard from Kooskia, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-06-02
US20160152926A1
Chemistry; metallurgy

PHOTORESIST REMOVAL

#2 | 2015-04-02
US20150094248A1
Chemistry; metallurgy

Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition

#3 | 2014-07-31
US20140213498A1
Physics

Photoresist removal

#4 | 2013-05-02
US20130109605A1
Chemistry; metallurgy

COMPOSITION AND PROCESS FOR POST-ETCH REMOVAL OF PHOTORESIST AND/OR SACRIFICIAL ANTI-REFLECTIVE MATERIAL DEPOSITED ON A SUBSTRATE

#5 | 2012-11-29
US20120302483A1
Chemistry; metallurgy

Photoresist removal

#6 | 2009-08-27
US20090215659A1
Physics

Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings

#7 | 2009-08-27
US20090212021A1
Electricity

COMPOSITIONS AND METHODS FOR SELECTIVE REMOVAL OF METAL OR METAL ALLOY AFTER METAL SILICIDE FORMATION

#8 | 2009-05-07
US20090118153A1
Chemistry; metallurgy

Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant

#9 | 2009-02-05
US20090032766A1
Electricity

COMPOSITION AND METHOD FOR SELECTIVELY ETCHING GATE SPACER OXIDE MATERIAL

#10 | 2008-10-02
US20080242574A1
Chemistry; metallurgy

Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition

#11 | 2008-01-10
US20080006305A1
Electricity

Resist, barc and gap fill material stripping chemical and method

#12 | 2007-08-09
US20070181852A1
Chemistry; metallurgy

PASSIVATIVE CHEMICAL MECHANICAL POLISHING COMPOSITION FOR COPPER FILM PLANARIZATION

InventorID:

223987 ⎘